Sidestepping Lithography In Chip Manufacturing
- 發佈日期 : 2024-05-24
- 資料來源:Semiconductor Engineering
- 瀏覽人次:56
Selective deposition could slow the need for additional lithography steps, helping to control costs for advanced-node chips.
Rising lithography costs, shrinking feature sizes, and the need for an alternative to copper are collectively spurring new interest in area-selective deposition. An extension of atomic layer deposition, ASD seeks to build circuit features from the bottom up, without relying on lithography.
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