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Sidestepping Lithography In Chip Manufacturing

  • 發佈日期 : 2024-05-24
  • 資料來源:Semiconductor Engineering
  • 瀏覽人次:15

Selective deposition could slow the need for additional lithography steps, helping to control costs for advanced-node chips.

Rising lithography costs, shrinking feature sizes, and the need for an alternative to copper are collectively spurring new interest in area-selective deposition. An extension of atomic layer deposition, ASD seeks to build circuit features from the bottom up, without relying on lithography.

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