Enabling Advanced Devices With Atomic Layer Processes
- 發佈日期 : 2024-04-19
- 資料來源：Semiconductor Engineering
- 瀏覽人次：17
Tradeoff between precision and speed becomes more critical at advanced nodes.
Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect fabrication at the most advanced nodes.
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